Implementation Date: 2010
Note: Deletions are strikethroughs. Insertions are underlined.
Catalog Copy
ECGR 6104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.
ECGR 8104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.
MEGR 7104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.
MEGR 8104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.