Request to establish ECGR 6104, 8104, MEGR 7104, and 8104

Date: February 15, 2010
To: College of Engineering
From: Julie Putnam, Administrative Assistant to Faculty Governance
Approved On: February 11, 2010
Implementation Date: 2010

Note: Deletions are strikethroughs. Insertions are underlined.

Catalog Copy

ECGR 6104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.

ECGR 8104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.

MEGR 7104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.

MEGR 8104. Fabrication of Nanomaterials. (3) Prerequisite: NANO 8101 or permission of instructor. Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders.